
The data from electron beam processing are presented for improving the adhesion strength of metal films. The basis of this is the directed change in the physicochemical properties of the near-surface layer of the glass by processing a band electron beam with an electron energy of E≤ 8 keV. The results can be used in precision micro-optics and integral optics technologies.
electron beam processing, electron beam microprocessing, електроннопроменева мікрообробка, електронний потік, electronic stream, nearsurface layer of glass, електронно-променева обробка, силікатне скло, silicate glass, приповерхневий шар скла
electron beam processing, electron beam microprocessing, електроннопроменева мікрообробка, електронний потік, electronic stream, nearsurface layer of glass, електронно-променева обробка, силікатне скло, silicate glass, приповерхневий шар скла
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