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Revista CENIC Ciencias Químicas
Article . 2009
Data sources: DOAJ
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Prueba de límite para n-hexano residual en policosanol por Espacio de Cabeza Estático -Cromatografía de Gases

Authors: Ernesto J. Méndez Antolín; Víctor L. González Canavaciolo; Yaisme Balcinde Quiñónez; Esperanza Rodríguez Cruz; Alexis González Pedroso;

Prueba de límite para n-hexano residual en policosanol por Espacio de Cabeza Estático -Cromatografía de Gases

Abstract

Como parte del proceso de obtención de un ingrediente activo, se deben tratar de eliminar en la mayor medida posible los disolventes empleados, pues sus restos constituyen impurezas potencialmente tóxicas. Por este motivo, los organismos reguladores de la Industria Farmacéutica tienen definidos los contenidos máximos permisibles para los disolventes residuales de los ingredientes activos utilizados en la producción de medicamentos, entre los cuales el n-hexano, empleado en la obtención del policosanol, presenta un límite de 290 ppm.1

Keywords

Chemistry, Science, Q, QD1-999

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
0
Average
Average
Average
gold