MRI: Acquisition of a sputtering system for contact metallization of WBG semiconductor for high temperature application in air ambient.

assignment_turned_inproject01 Oct 2010(Started)-30 Sep 2013(Ended)Closed

Funder: National Science FoundationProject code: 1040200

Funded under: Directorate for Mathematical & Physical Sciences | Division of Materials Research

MRI: Acquisition of a sputtering system for contact metallization of WBG semiconductor for high temperature application in air ambient.

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MRI: Acquisition of a sputtering system for contact metallization of WBG semiconductor for high temperature application in air ambient.

MRI: Acquisition of a sputtering system for contact metallization of WBG semiconductor for high temperature application in air ambient.

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