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handle: 10261/112991
La finalidad de este proyecto es contribuir al desarrollo de circuitos integrados utilizando dispositivos con una o varias regiones de resistencia diferencial negativa (NDR) en su característica I-V y, más especificamente, con diodos basados en el efecto túnel resonante (RTDs). En tecnologías III/V, estos dispositivos en combinación con transistores han demostrado reducción de área y consumo de potencia e incremento de velocidad frente a realizaciones convencionales, que se asocian a su característica con una región NDR
Puertas MOS NDR. Tecnología UMC 0.13µm 8 metales
No
NDR
NDR
| selected citations These citations are derived from selected sources. This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically). | 0 | |
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