publication . Article . 2006

internal friction of amorphous and nanocrystalline silicon at low temperatures

Xiao Liu; C.L. Spiel; R.D. Merithew; R.O. Pohl; B.P. Nelson; Qi Wang; R.S. Crandall;
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  • Published: 09 Aug 2006 Journal: Materials Science and Engineering: A, volume 442, pages 307-313 (issn: 0921-5093, Copyright policy)
  • Publisher: Elsevier BV
Abstract
Abstract We measured the low temperature internal friction of a variety of hydrogenated amorphous, nanocrystalline, polycrystalline, and epitaxial silicon thin films. Most of the films studied are prepared either by hot-wire chemical-vapor deposition (HWCVD) or by plasma-enhanced chemical-vapor deposition (PECVD). We show that structural changes with varying modes of deposition can be monitored by the internal friction measurements, which are a sensitive probe to structural disorder resulted from atomic tunneling states below 10 K. For hydrogenated amorphous silicon films, the measurements are also sensitive to the content of atomic hydrogen and bulk molecular h...
Subjects
free text keywords: Mechanical Engineering, General Materials Science, Mechanics of Materials, Condensed Matter Physics, Materials science, Amorphous solid, Thin film, Nanocrystalline material, Nanotechnology, Nanocrystalline silicon, Silicon, chemistry.chemical_element, chemistry, Plasma-enhanced chemical vapor deposition, Composite material, Chemical engineering, Amorphous silicon, chemistry.chemical_compound, Amorphous carbon
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