publication . Article . 2002

Fabrication and characterization of truly 3-D diffuser/nozzle microstructures in silicon

Matthias Heschel; Matthias Müllenborn; Siebe Bouwstra;
Open Access English
  • Published: 24 Aug 2002
  • Country: Denmark
We present microfabrication and characterization of truly three-dimensional (3-D) diffuser/nozzle structures in silicon. Chemical vapor deposition (CVD), reactive ion etching (RIE), and laser-assisted etching are used to etch flow chambers and diffuser/nozzle elements. The flow behavior of the fabricated elements and the dependence of diffuser/nozzle efficiency on structure geometry has been investigated. The large freedom of 3-D micromachining combined with rapid prototyping allows one to characterize and optimize diffuser/nozzle structures.
Persistent Identifiers
free text keywords: Silicon, chemistry.chemical_element, chemistry, Microfabrication, Tuyere, Surface micromachining, Isotropic etching, Optoelectronics, business.industry, business, Materials science, Nozzle, Etching, Reactive-ion etching, Analytical chemistry
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