publication . Article . 2016

MEASUREMENT OF MICROHARDNESS OF PHOTORESIST FILMS ON SILICON BY THE SCRATCHING METHOD

D. I. Brinkevich; V. S. Prosolovich; Yu. N. Yankovski; S. A. Vabishchevich; N. V. Vabishchevich; V. E. Gaishun;
Open Access
  • Published: 07 Jun 2016 Journal: Devices and Methods of Measurements, volume 7, pages 77-84 (issn: 2220-9506, eissn: 2414-0473, Copyright policy)
  • Publisher: Belarusian National Technical University
Abstract
In recent years new types of resist for nano and submicronic lithography are intensively developed. As perspective materials for resist various polymeric compositions on a basis thermally and mechanically resistant polymers are considered. The purpose of the real work was studying of possibility of application of a microindentation and scratching methods for research of strength properties of films of the polymeric resist applied on plates of single-crystal silicon. As an example films of positive diazoquinonenovolak photoresist 1,0–5,0 μm thick which were applied on plates of silicon of various brands with a centrifugation method were used. The comparative anal...
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Subjects
free text keywords: photoresist, silicon, scratching, indentation, microhardness, Resist, Silicon, chemistry.chemical_element, chemistry, Photoresist, Materials science, Lithography, Diamond, engineering.material, engineering, Composite material, Indentation hardness, Indentation, Resistive touchscreen, lcsh:Engineering (General). Civil engineering (General), lcsh:TA1-2040
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