Nanoscale Etching of In0.53Ga0.47As in H2O2/HCl Solutions for Advanced CMOS Processing

descriptionPublicationkeyboard_double_arrow_right Article 01 Jan 2014 English Publisher:The Electrochemical SocietyJournal:ECS Journal of Solid State Science and Technology, volume 3, pages P179-P184 (issn: 2162-8769, eissn: 2162-8777,

Authors: Jens Rip; John J. Kelly; Dennis H. van Dorp; Frank Holsteyns; Daniel Cuypers; Daniel Cuypers; Sophia Arnauts; +2 Authors

doi: 10.1149/2.021405jss

Nanoscale Etching of In0.53Ga0.47As in H2O2/HCl Solutions for Advanced CMOS Processing

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