Laser annealing of phosphosilicate glass
Copyright policy ) J. T. Boyd; A. Naumaan;
Laser annealing of phosphosilicate glass
Laser annealing of CVD layers of phosphosilicate glass (PSG) using a CO2 laser (10.6 μm wavelength) has been investigated. Evidence of plastic flow of the PSG caused by laser heating was obtained. Reduction of surface and bulk defects in the PSG layers was ascertained by measurement of scattering losses, before and after annealing, of He–Ne radiation (632.8 μm) waveguiding in the layers. An improvement in attenuation of as much as 12 dB/cm was obtained.
- University of Cincinnati United States
- University System of Ohio United States
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citations
Citations provided by BIP!
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
Citations provided by BIP!popularityPopularity provided by BIP!
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
Popularity provided by BIP! 5
Average
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