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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Journal of Microelec...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
Journal of Microelectromechanical Systems
Article . 2006 . Peer-reviewed
License: IEEE Copyright
Data sources: Crossref
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Piezoelectrically Actuated Tunable Capacitor

Authors: C.-Y. Lee; E.S. Kim;

Piezoelectrically Actuated Tunable Capacitor

Abstract

This paper describes the design, fabrication, and characterization of the first MEMS piezoelectric tunable capacitors employing zinc oxide (ZnO) actuation. Relatively simple design rules for the device-structure optimization for largest deflection are shown from simulation results based on theoretical equations. The ZnO-actuated tunable capacitors are accordingly designed and fabricated with both surface and bulk micromachining techniques. Through the surface micromachining process, sacrificial silicon is removed with XeF2, and parylene is successfully used as a supporting layer for a piezoelectric unimorph cantilever. For comparison, other two different structures using plasma-enhanced chemical-vapor deposition (PECVD) SiN and SU-8 as supporting layers are also fabricated. Deflection analyses are performed for three specific structures, among which the parylene-supported one is demonstrated to have the largest displacement and most suitable for tunable capacitor application. For bulk-micromachined tunable capacitor, we have implemented a novel design of a large structure driven by a ZnO unimorph, and obtained a tuning ratio of more than 21:1 (0.46 pF-10.02 pF). This is the highest tuning ratio reported to date for parallel-plate tunable capacitors while requiring an applied voltage of only 35 V

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
21
Average
Top 10%
Top 10%
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