Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment

Article . 2009 . Peer-reviewed

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Projection XEUV-nanolithography

descriptionPublicationkeyboard_double_arrow_right Article 01 May 2009 English Publisher:Elsevier BVJournal:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, volume 603, pages 147-149 (issn: 0168-9002,

Authors: N.N. Salashchenko; N.I. Chkhalo;

doi: 10.1016/j.nima.2008.12.181

Projection XEUV-nanolithography

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Abstract

A short review of present state of the art of projection photolithography is given. Progress and main problems of the EUV lithography have received primary consideration. Advantages of using synchrotrons as sources of EUV radiation in commercial EUV scanners are considered. Present state of the art of EUV lithography in Russia is reported.

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