publication . Preprint . 2016

Faraday cage angled-etching of nanostructures in bulk dielectrics

Latawiec, Pawel; Burek, Michael J.; Sohn, Young-Ik; Lončar, Marko;
Open Access English
  • Published: 11 Mar 2016
For many emerging optoelectronic materials, heteroepitaxial growth techniques do not offer the same high material quality afforded by bulk, single-crystal growth. However, the need for optical, electrical, or mechanical isolation at the nanoscale level often necessitates the use of a dissimilar substrate, upon which the active device layer stands. Faraday cage angled-etching (FCAE) obviates the need for these planar, thin-film technologies by enabling in-situ device release and isolation through an angled-etching process. By placing a Faraday cage around the sample during inductively-coupled plasma reactive ion etching (ICP-RIE), the etching plasma develops an e...
free text keywords: Condensed Matter - Mesoscale and Nanoscale Physics
Funded by
  • Funder: Natural Sciences and Engineering Research Council of Canada (NSERC)
NSF| Graduate Research Fellowship Program (GRFP)
  • Funder: National Science Foundation (NSF)
  • Project Code: 1144152
  • Funding stream: Directorate for Education & Human Resources | Division of Graduate Education
NSF| NNIN: National Nanotechnology Infrastructure Network
  • Funder: National Science Foundation (NSF)
  • Project Code: 0335765
  • Funding stream: Directorate for Engineering | Division of Electrical, Communications & Cyber Systems
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