publication . Preprint . 2013

Fabrication of high quality GaN nanopillar arrays by dry and wet chemical etching

Paramanik, Dipak; Motayed, Abhishek; King, Matthew; Ha, Jong-Yoon; Kryluk, Sergi; Davydov, Albert V.; Talin, Alec;
Open Access English
  • Published: 01 Nov 2013
We study strain relaxation and surface damage of GaN nanopillar arrays fabricated using inductively coupled plasma (ICP) etching and post etch wet chemical treatment. We controlled the shape and surface damage of such nanopillar structures through selection of etching parameters. We compared different substrate temperatures and different chlorine-based etch chemistries to fabricate high quality GaN nanopillars. Room temperature photoluminescence and Raman scattering measurements were carried to study the presence of surface defect and strain relaxation on these nanostructures, respectively. We found that wet KOH etching can remove the side wall damages caused by...
mesheuropmc: fungimacromolecular substancestechnology, industry, and agriculture
free text keywords: Condensed Matter - Mesoscale and Nanoscale Physics, Physics - Plasma Physics, Condensed Matter - Materials Science
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