publication . Patent . 1991

Verfahren zum Herstellen einer wasserfreien Siliziumdioxidschicht

Klumpp, A.;
Open Access German
  • Published: 01 Jan 1991
  • Country: Germany
Abstract
In a process for the production of a moistureless silicon dioxide layer starting from a silicate layer, polysiloxane is photoinduced, polymerized and separated, whereupon the polysiloxane layer is converted into a silicate layer. By transforming the the silicate layer by chemical reaction of the water bound in said layer by means of silane, the silicate layer is converted into a moistureless silicon dioxide layer.
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