publication . Conference object . Other literature type . 2008

A high sensitivity process variation sensor utilizing sub-threshold operation

Mesut Meterelliyoz; Peilin Song; Franco Stellari; Jaydeep P. Kulkarni; Kaushik Roy;
Open Access
  • Published: 01 Jan 2008
  • Publisher: IEEE
  • Country: United States
In this paper, we propose a novel low-power, bias-free, high-sensitivity process variation sensor for monitoring random variations in the threshold voltage. The proposed sensor design utilizes the exponential current-voltage relationship of sub-threshold operation thereby improving the sensitivity by 2.3X compared to the above-threshold operation. A test-chip containing 128 PMOS and 128 NMOS devices has been fabricated in 65nm bulk CMOS process technology. A total of 28 dies across the wafer have been fully characterized to determine the random threshold voltage variations.
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free text keywords: image segmentation, Integrated circuits, Process engineering, random processes, Sensitivity analysis, Sensors, Wafer, PMOS logic, CMOS, Integrated circuit, law.invention, law, NMOS logic, Materials science, Threshold voltage, Electronic engineering, Stochastic process, Process variation
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