publication . Article . 2015

Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation

Jeremy L. Schroeder; W. Thomson; B. Howard; N. Schell; Lars-Åke Näslund; Lina Rogström; M.P. Johansson-Jõesaar; Naureen Ghafoor; Magnus Odén; E. Nothnagel; ...
Open Access English
  • Published: 23 Sep 2015
  • Publisher: Linköpings universitet, Tekniska fakulteten
  • Country: Sweden
We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and cathodic arc deposition system purposefully designed for time-resolved in situ thin film deposition/annealing studies using high-energy (greater than50 keV), high photon flux (greater than10(12) ph/s) synchrotron radiation. The high photon flux, combined with a fast-acquisition-time (less than1 s) two-dimensional (2D) detector, permits time-resolved in situ structural analysis of thin film formation processes. The high-energy synchrotron-radiation based x-rays result in small scattering angles (less than11 degrees), allowing large areas of reciprocal space to be imaged...
Persistent Identifiers
free text keywords: Physical Sciences, Fysik, Optics, business.industry, business, Vacuum deposition, Cathodic arc deposition, Ultra-high vacuum, Materials science, Synchrotron radiation, Sputter deposition, Thin film, Beamline, Pulsed laser deposition
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