publication . Thesis . 2004

Vapour and electro-deposited metal films on copper: structure and reactivity

McEvoy, Thomas F.;
Open Access English
  • Published: 01 Jan 2004
  • Publisher: Dublin City University. School of Mechanical and Manufacturing Engineering
  • Country: Ireland
Abstract
The systems studied involve deposition of metals of a larger atomic diameter on a Cu{100} single crystal surface under vacuum and determining the structures formed along with the effect on the Cu{100} substrate. Cu microelectrodes were fabricated and characterised with Indium electrodeposited on the electrode surface. The In on Cu{ 100} growth mode is compared with the growth mode of electrodeposited Indium on Cu microelectrodes. The Cu{100}/In system has been studied for the In coverage range 0.1-0.65 monolayer using Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and scanning tunnelling microscopy (STM). The Auger signal versus deposi...
Subjects
free text keywords: Materials, Thin films, Surfaces (Technology); Coatings
Related Organizations

Chapter 1 Theoretical Framework and Literature Survey...................................................................... 1

Introduction........................................................................................ 2 Surface Theory...................................................................................3 Ultra H igh Vacuum ...........................................................................12 Auger Electron Spectroscopy (A E S )...........................................14 L ow Energy Electron Diffraction (LEED )............................... 18 Scanning Tunnelling M icroscopy (ST M )................................ 23 Electrochemistry theory..................................................................30 Cyclic Voltammetry........................................................................ 36 Chronoamperometry........................................................................39 R eferences...........................................................................................41

C h a p t e r 2 V a p o u r D e p o s it io n o f I n o n a C u { 1 0 0 } s u b s t r a t e ................................................................................. 44

Introduction....................................................................................... 45 Experim ental.......................................................... 47 Results and D iscu ssion ................................................................... 49 AES results........................................................................................ 49 LEED results...................................................................................... 55 STM results..................................................................... 70 Surface A lloy Formation................................................................74 H igh In Coverages: Overlayer formation..................................78 C onclusions........................................................................................86 Chapter 3 Vapour Deposition of Sb on aCu{100} Substrate ................................................................................. 91

Chapter 4 Fabrication and Characterisation of Copper Microelectrodes.................................................. 120 C h a p t e r 5 E le c t r o d e p o s it io n o f I n d iu m o n C o p p e r M i c r o e l e c t r o d e s ...................................................................1 7 1

Introduction.......................................................... .....1 7 2 Experimental....................................................................................175 Results and D iscu ssion .................................................................177 Potential w indow ........................................................................... 177 Comparison o f scan rate versus amount o f indium deposition ............................................................................................................185 Scanning Electron M icroscopy (SEM ) results...................... 190 Energy Dispersive X-ray analysis (EDX) results................. 196 Elucidation o f nucléation type and growth m ode................. 198 K inetics for Indium deposition.................................................. 208 Electrochemical Stripping o f the Copper M icroelectrode

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