publication . Article . Other literature type . 2016

Interface Engineering for Atomic Layer Deposited Alumina Gate Dielectric on SiGe Substrates.

Joseph C. Woicik; Yuzheng Guo; Kechao Tang; Majeed A. Foad; John Robertson; Vinayak Vishwanath Hassan; Piero Pianetta; Paul C. McIntyre; Liangliang Zhang;
Open Access English
  • Published: 12 Jul 2016
  • Publisher: American Chemical Society
  • Country: United Kingdom
Optimization of the interface between high-k dielectrics and SiGe substrates is a challenging topic due to the complexity arising from the coexistence of Si and Ge interfacial oxides. Defective high-k/SiGe interfaces limit future applications of SiGe as a channel material for electronic devices. In this paper, we identify the surface layer structure of as-received SiGe and Al2O3/SiGe structures based on soft and hard X-ray photoelectron spectroscopy. As-received SiGe substrates have native SiOx/GeOx surface layers, where the GeOx-rich layer is beneath a SiOx-rich surface. Silicon oxide regrows on the SiGe surface during Al2O3 atomic layer deposition, and both Si...
free text keywords: Al2O3, MOSCAP, SiGe, atomic layer deposition, high-k, interface traps, General Materials Science, Surface layer, X-ray photoelectron spectroscopy, Annealing (metallurgy), Forming gas, High-κ dielectric, Materials science, Optoelectronics, business.industry, business, Silicon oxide, Gate dielectric
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