Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation
Payo, M. Recaman
- Publisher: AMSTERDAM
Wet chemical cleaning; Surface treatment; Intrinsic amorphous silicon; Boron emitter; Passivat ion; Annealing
The influence of the cleaning process on the amorphous silicon passivation of homojunction emitters is investigated. A significant variation in the passivation quality following different cleaning sequences is not observed, even though differences in cleaning performanc...