Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation

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Meddeb, H. ; Bearda, Twan ; Payo, M. Recaman ; Abdelwahab, I. ; Abdulraheem, Yaser ; Ezzaouia, H. ; Gordon, I. ; Szlufcik, J. ; POORTMANS, Jef (2015)
  • Publisher: AMSTERDAM
  • Related identifiers: doi: 10.1016/j.apsusc.2014.11.180
  • Subject: Wet chemical cleaning; Surface treatment; Intrinsic amorphous silicon; Boron emitter; Passivat ion; Annealing

The influence of the cleaning process on the amorphous silicon passivation of homojunction emitters is investigated. A significant variation in the passivation quality following different cleaning sequences is not observed, even though differences in cleaning performanc... View more
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