Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation

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Meddeb, H.; Bearda, Twan; Payo, M. Recaman; Abdelwahab, I.; Abdulraheem, Yaser; Ezzaouia, H.; Gordon, I.; Szlufcik, J.; POORTMANS, Jef;
  • Publisher: AMSTERDAM
  • Related identifiers: doi: 10.1016/j.apsusc.2014.11.180
  • Subject: Wet chemical cleaning; Surface treatment; Intrinsic amorphous silicon; Boron emitter; Passivat ion; Annealing

The influence of the cleaning process on the amorphous silicon passivation of homojunction emitters is investigated. A significant variation in the passivation quality following different cleaning sequences is not observed, even though differences in cleaning performanc... View more
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