publication . Article . Conference object . 2016

Deposition of the low resistive ITO-films by means of reactive magnetron sputtering of the In/Sn target on the cold substrate

Y S Zhidik; P E Troyan; D V Korzhenko; E V Baturina; Y N Yurjev;
Open Access
  • Published: 01 Jan 2016 Journal: IOP Conference Series: Materials Science and Engineering, volume 135, page 12,055 (issn: 1757-8981, eissn: 1757-899X, Copyright policy)
  • Publisher: IOP Publishing
  • Country: Russian Federation
Abstract
Detailed information on the deposition technology of the low-resistive ITO-films in oxygen-containing media by magnetron reactive sputtering from the In(90%)/Sn(10%) target on the cold substrate is given. Developed technology allows deposition ITO-films with sheet resistance 2-3 Ω/, transparency higher than 90%. Developed technology is notable for high reproducibility of results and is compatible with production technology of semiconductor devices of optoelectronics.
Subjects
free text keywords: сопротивление, пленки, реактивное распыление, магнетронное распыление, мишени, подложки, осаждение, полупроводниковые приборы, оптоэлектроника, Reproducibility, Substrate (chemistry), Optoelectronics, business.industry, business, Deposition (law), Sheet resistance, Semiconductor device, Nanotechnology, Cavity magnetron, Resistive touchscreen, Sputtering, Materials science
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