Deposition of the low resistive ITO-films by means of reactive magnetron sputtering of the In/Sn target on the cold substrate

Conference object English OPEN
Zhidik, Y. S.; Troyan, P. E.; Baturina, E. V.; Korzhenko, Dmitry Vladimirovich; Yuriev, Yuri Nikolaevich;
  • Publisher: IOP Publishing
  • Related identifiers: doi: 10.1088/1757-899X/135/1/012055
  • Subject: сопротивление | пленки | реактивное распыление | магнетронное распыление | мишени | подложки | осаждение | полупроводниковые приборы | оптоэлектроника

Detailed information on the deposition technology of the low-resistive ITO-films in oxygen-containing media by magnetron reactive sputtering from the In(90%)/Sn(10%) target on the cold substrate is given. Developed technology allows deposition ITO-films with sheet resis... View more
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