Room temperature synthesis of porous SiO2 thin films by plasma enhanced chemical vapor deposition

Article English OPEN
Barranco Quero, Ángel; Cotrino Bautista, José; Yubero Valencia, Francisco; Espinós Manzorro, Juan Pedro; Rodríguez González-Elipe, Agustín;
(2004)
  • Publisher: AVS Science and Technology Society
  • Related identifiers: doi: 10.1116/1.1761072
  • Subject:
    mesheuropmc: equipment and supplies | technology, industry, and agriculture

Synthesis of porous SiO2 thin films in room temperature was carried out using plasma enhanced chemical vapor deposition (CVD) in an electron cyclotron resonance microwave reactor with a downstream configuration.The gas adsorption properties and the type of porosity of t... View more
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