Electron-beam lithography with the scanning tunneling microscope

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Marrian, Christie R. K.;
(1992)

The scanning tunneling microscope (STM), operated in vacuum in the field emission mode, has been used in lithographic studies of the resist SAL‐601 from Shipley. Patterns have been written by raising the tip–sample voltage above −12 V while operating the STM in the cons... View more
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