publication . Article . Other literature type . 2014

A Short History of Atomic Layer

Puurunen, Riikka L.;
Open Access English
  • Published: 15 Oct 2014
Abstract
Atomic layer deposition (ALD) is a thin film growth technique based on the repeated use of separate, saturating gas-solid reactions. The principle of ALD has been discovered twice; in the 1960s under the name “molecular layering” in the Soviet Union, and in the 1970s under the name “atomic layer epitaxy” (ALE) in Finland. In 2014, it is forty years since the filing of the worldwide patent on ALE as a method for the growth of compound thin films. This essay celebrates the fortieth anniversary of ALE-ALD, briefly telling the story of ALE as shared by its Finnish inventor, Dr. Tuomo Suntola. Initially, ALE was aimed at the growth of high-quality polycrystalline ZnS...
Subjects
free text keywords: Virtual Project on the History of ALD, VPHA, atomic layer deposition, ALD, atomic layer epitaxy, ZnS, EL displays, history, Process Chemistry and Technology, General Chemistry, Surfaces and Interfaces, Materials science, Nanotechnology, Industrial history, Thin film
Communities
Digital Humanities and Cultural Heritage
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publication . Article . Other literature type . 2014

A Short History of Atomic Layer

Puurunen, Riikka L.;