A short history of atomic layer deposition:Tuomo Suntola's atomic layer epitaxy

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Puurunen, Riikka L.;
  • Journal: volume 20, pages 332-344issn: 0948-1907
  • Publisher copyright policies & self-archiving
  • Identifiers: doi: 10.1002/cvde.201402012
  • Subject: atomic layer deposition | VPHA | A1 Refereed journal article | EL displays | 114 Physics | history | /fi/minedu/virta/openaccess/3 | /fi/minedu/virta/publicationtypes/a1 | 3 Hybrid publication | atomic layer epitaxy | Virtual Project on the History of ALD | ALD | 213 Electronics, automation, information engineering | ZnS | /fi/minedu/virta/scienceareas/114 | /fi/minedu/virta/scienceareas/213

Atomic layer deposition (ALD) is a thin film growth technique based on the repeated use of separate, saturating gas‐solid reactions. The principle of ALD has been discovered twice; in the 1960s under the name “molecular layering” in the Soviet Union, and in the 1970s un... View more
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