publication . Article . 2012

Review of reference metrology for nanotechnology: significance, challenges, and solutions

Ukraintsev, Vladimir;
Open Access
  • Published: 27 Feb 2012 Journal: Journal of Micro/Nanolithography, MEMS, and MOEMS, volume 11, page 11,010 (issn: 1932-5150, Copyright policy)
  • Publisher: SPIE-Intl Soc Optical Eng
Abstract
Metrology and control of critical dimension (CD) are key to the success of nanotechnology. Modern nanotechnology and nanometrology are largely based on knowledge developed during the last 10 to 20 years of semiconductor manufacturing. Semiconductor CD metrology entered the nanotechnology age in the late 1990s. Work on 130-nm- and 90- nm-node technologies led to the conclusion that precision alone is an insufficient metric for the quality assessment of metrology. Other components of measurement uncertainty (MU) must also be considered: 1. sample- to-sample measurement bias variation, 2. sampling uncertainty, and 3. sample variation induced by the probe-sample int...
Subjects
free text keywords: Mechanical Engineering, Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Condensed Matter Physics, Metrology, Systematic error, Atomic force microscopy, Nanotechnology, Limiting, Physics, Measurement uncertainty, Semiconductor device fabrication, Nanometrology
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publication . Article . 2012

Review of reference metrology for nanotechnology: significance, challenges, and solutions

Ukraintsev, Vladimir;