publication . Doctoral thesis . 2016

Direct Liquid Evaporation Chemical Vapor Deposition(DLE-CVD) of Nickel, Manganese and Copper-Based Thin Films for Interconnects in Three-Dimensional Microelectronic Systems

Li, Kecheng;
Open Access English
  • Published: 01 Jan 2016
  • Publisher: Harvard University
  • Country: United States
Abstract
Engineering and Applied Sciences - Applied Physics
Subjects
free text keywords: Chemistry, Physical, Engineering, Materials Science
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