Joint Research on Scatterometry and AFM Wafer Metrology

Conference object English OPEN
Bodermann, B.; Buhr, E.; Danzebrink, H.U.; Bär, M.; Scholze, F.; Krumrey, M.; Wurm, M.; Klapetek, P.; Hansen, P.E.; Korpelainen, V.; Van Veghel, M.; Yacoot, A.; Siitonen, S.; El Gawhary, O.; Burger, S.; Saastamoinen, T.;
  • Publisher: American Institute of Physics
  • Subject: scatterometry | CD metrology | reference standard | AFM | inverse diffraction problem | rigorous modelling

Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable lin... View more
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