Numerical study of extreme-ultra-violet generated plasmas in hydrogen
Publisher: Universiteit Twente
Subject: IR-100349 | METIS-316610
In this thesis, we present the development and study a numerical model of EUV-induced plasma. Understanding of behavior of low pressure low density plasmas is of industrial relevance, because of their potential use for on-line removal of different forms of contamination... View more
Chapter 5 D.I. Astakhov, W.J. Goedheer, C.J. Lee, V.V. Ivanov, V.M. Krivtsun, A.I. Zotovich, S.M. Zyryanov, D.V. Lopaev, and F. Bijkerk, Plasma probe characteristics in low density hydrogen pulsed plasmas, Plasma Sources Sci. Technol. 24, 055018 (2015).
Chapter 6 D.I. Astakhov, W.J. Goedheer, C.J. Lee, V.V. Ivanov, V.M. Krivtsun, K.N. Koshelev, D.V. Lopaev, R.M. van der Horst, J. Beckers, E.A. Osorio, F. Bijkerk, Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen, submied Chapter 7 D.I. Astakhov, W.J. Goedheer, C.J. Lee, V.V. Ivanov, V.M. Krivtsun, O. Yakushev, K.N. Koshelev, D. V. Lopaev, and F. Bijkerk, Numerical and experimental studies of the carbon etching in EUV-induced plasma, submied
 V. Y. Banine, K. N. Koshelev, and G. H. P. M. Swinkels. “Physical processes in EUV sources for microlithography”. In: Journal of Physics D: Applied Physics Vol. 44, No. 25 (2011), p. 253001. : 10.1088/0022-3727/44/25/253001.