
Представлен метод анализа магнито-эллипсометрических измерений. Детально рассматрива- ется двуслойная модель ферромагнитных отражающих пленок. Полученный алгоритм может использоваться для контроля оптических и магнито-оптических свойств пленок в процессе их роста в вакуумных камерах
An approach to analysis of magneto-optical ellipsometry measurements is presented. A two-layer model of ferromagnetic reflective films is in focus. The obtained algorithm can be used to control optical and magneto-optical properties during films growth inside vacuum chambers
магнито-оптическая эллипсометрия, two-layer model, growth control, Magneto-optical ellipsometry, отражение, ферромагнетик, 530, 620, двухслойная модель, Kerr effect, 29.19.16, контроль роста, ferromagnetic metal, эффект Керра, reflection
магнито-оптическая эллипсометрия, two-layer model, growth control, Magneto-optical ellipsometry, отражение, ферромагнетик, 530, 620, двухслойная модель, Kerr effect, 29.19.16, контроль роста, ferromagnetic metal, эффект Керра, reflection
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