publication . Article . 2017

Molecular dynamic simulation study of plasma etching L10 FePt media in embedded mask patterning (EMP) process

Jianxin Zhu; P. Quarterman; Jian-Ping Wang;
Open Access
  • Published: 22 Feb 2017 Journal: AIP Advances, volume 7, page 56,507 (eissn: 2158-3226, Copyright policy)
  • Publisher: AIP Publishing
Abstract
Plasma etching process of single-crystal L10-FePt media [H. Wang et al., Appl. Phys. Lett. 102(5) (2013)] is studied using molecular dynamic simulation. Embedded-Atom Method [M. S. Daw and M. I. Baskes, Phy. Rev. B 29, 6443 (1984); X. W. Zhou, R. A. Johnson and H. N. G. Wadley, Phy. Rev. B 69, 144113 (2004)] is used to calculate the interatomic potential within atoms in FePt alloy, and ZBL potential [J.F. Ziegler, J. P. Biersack and U. Littmark, “The Stopping and Range of Ions in Matter,” Volume 1, Pergamon,1985] in comparison with conventional Lennard-Jones “12-6” potential is applied to interactions between etching gas ions and metal atoms. It is shown the pos...
Subjects
free text keywords: Interatomic potential, Plasma etching, Chemistry, Etching, Crystallographic defect, Condensed matter physics, Ion, Etching (microfabrication), Molecular dynamics, Surface layer, Physics, QC1-999
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publication . Article . 2017

Molecular dynamic simulation study of plasma etching L10 FePt media in embedded mask patterning (EMP) process

Jianxin Zhu; P. Quarterman; Jian-Ping Wang;