Molecular dynamic simulation study of plasma etching L10 FePt media in embedded mask patterning (EMP) process

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Jianxin Zhu; P. Quarterman; Jian-Ping Wang;

Plasma etching process of single-crystal L10-FePt media [H. Wang et al., Appl. Phys. Lett. 102(5) (2013)] is studied using molecular dynamic simulation. Embedded-Atom Method [M. S. Daw and M. I. Baskes, Phy. Rev. B 29, 6443 (1984); X. W. Zhou, R. A. Johnson and H. N. G.... View more
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