A MONTÉ CARLO MODEL FOR SIMULATING THE NITROGEN DIFFUSION EFFECT INTO B-LPCVD-NIDOS POLYCRYSTALLINE THIN FILMS

Article Arabic OPEN
S ALLAG; S MERABET; M BOUKEZZATA;
(2012)
  • Publisher: Université Mentouri
  • Journal: Sciences & Technologie (issn: 1111-5041, eissn: 1111-5041)
  • Publisher copyright policies & self-archiving
  • Subject: monte carlo simulation | LPCVD | Boron Implantation | Polycritalline silicon | Technology | T | Science | Q

The principal objective of our current work, is to study the influence of different treatment from surface which makes it possible to improve the properties of materials by technique of beam of ions (diffusion – implantation), on the distribution of the particles in a s... View more
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