The Morphology of Ordered Block Copolymer Patterns as Probed by High Resolution Imaging

Other literature type, Article English OPEN
Borah, Dipu; Ghoshal, Tandra; Shaw, Matthew T.; Chaudhari, Atul; Petkov, Nikolay; Bell, A. P.; Holmes, Justin D.; Morris, Michael A.;
  • Publisher: InTech
  • Journal: Nanomaterials and Nanotechnology, volume 4, issue Godište 2014 (issn: 1847-9804, eissn: 1847-9804)
  • Publisher copyright policies & self-archiving
  • Related identifiers: doi: 10.5772/59098
  • Subject: Polystyrene-b-polyethylene oxide | Polystyrene -bpolyethylene Oxide | Polystyrene-b-polymethylmethacrylate | Polystyrene-b-polydimethyl Siloxane | Thin Films | Block Copolymer | Polystyrene-b-polyvinylypyridine | Technology (General) | Defects | block copolymer; thin films; defects; polystyrene-b-polymethylmethacrylate; polystyrene-b-polyethylene oxide; polystyrene-b-polydimethyl siloxane; polystyrene-b-polyvinylpyridine; electron microscopy; helium ion microscopy | Electron Microscopy | Helium Ion Microscopy | T1-995

The microphase separation of block copolymer (BCP) thin films can afford a simple and cost-effective means to studying nanopattern surfaces, and especially the fabrication of nanocircuitry. However, because of complex interface effects and other complications, their 3D ... View more