The microphase separation of block copolymer (BCP) thin films can afford a simple and cost-effective means to studying nanopattern surfaces, and especially the fabrication of nanocircuitry. However, because of complex interface effects and other complications, their 3D ... View more
 Hu H, Gopinadhan M, Osuji CO (2014) Directed selfassembly of block copolymers: A tutorial review of strategies for enabling nanotechnology with soft matter. Soft Matter, Advance Article 10: 3867. DOI: 10.1039/C3SM52607K.
 Ruiz R, Kang HM, Detcheverry FA, Dobisz E, Kercher S, Albrecht TR, de Pablo JJ, Nealey PF (2008) Density multiplication and improved lithography by directed block copolymer assembly. Science 321: 936-939.
 Jeong S-J, Kim JY, Kim BH, Moon HS, Kim SO (2013) Directed self-assembly of block copolymers for next generation nanolithography. Materials Today 16: 468-476.
 Farrell RA, Kinahan NT, Hansel S, Stuen KO, Petkov N, Shaw MT, West LE, Djara V, Dunne RJ, Varona OG, Gleeson PG, Jung SJ, Kim HY, Koleśnik MM, Lutz T, Murray CP, Holmes JD, Nealey PF, Duesberg GS, Krstić V, Morris MA (2012) Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly. Nanoscale 4: 3228-3236.
 Farrell RA, Petkov N, Shaw MT, Djara V, JD Holmes, Morris MA (2010) Monitoring PMMA elimination by reactive ion etching from a lamellar PS-b-PMMA thin film by ex situ TEM methods. Macromolecules 43: 8651-8655.
 International Technology Roadmap for Semiconductors, Emerging Research Materials. http://www.itrs.net/Links/2013ITRS/2013Chapters/20 13ERM.pdf (2013).