On the Origin of Light Emission in Silicon Rich Oxide Obtained by Low-Pressure Chemical Vapor Deposition
A. A. González-Fernández
- Publisher: Hindawi Limited
Journal of Nanomaterials
(issn: 1687-4110, eissn: 1687-4129)
Technology (General) | T1-995 | Article Subject
Silicon Rich Oxide (SRO) has been considered as a material to overcome the drawbacks of silicon to achieve optical functions. Various techniques can be used to produce it, including Low-Pressure Chemical Vapor Deposition (LPCVD). In this paper, a brief description of th...