On the Origin of Light Emission in Silicon Rich Oxide Obtained by Low-Pressure Chemical Vapor Deposition

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M. Aceves-Mijares ; A. A. González-Fernández ; R. López-Estopier ; A. Luna-López ; D. Berman-Mendoza ; A. Morales ; C. Falcony ; C. Domínguez ; R. Murphy-Arteaga (2012)
  • Publisher: Hindawi Limited
  • Journal: Journal of Nanomaterials (issn: 1687-4110, eissn: 1687-4129)
  • Related identifiers: doi: 10.1155/2012/890701
  • Subject: Technology (General) | T1-995 | Article Subject

Silicon Rich Oxide (SRO) has been considered as a material to overcome the drawbacks of silicon to achieve optical functions. Various techniques can be used to produce it, including Low-Pressure Chemical Vapor Deposition (LPCVD). In this paper, a brief description of th... View more
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