publication . Article . 1998

Plasma Process Modeling for Integrated Circuits Manufacturing

Meyyappan, M.; Govindan, T. R.;
Open Access English
  • Published: 01 Jan 1998 Journal: VLSI Design (issn: 1065-514X, eissn: 1563-5171, Copyright policy)
  • Publisher: Hindawi Limited
Abstract
A reactor model for plasma-based deposition and etching is presented. Two-dimensional results are discussed in terms of plasma density, ion flux, and ion energy. Approaches to develop rapid CAD-type models are discussed.
Subjects
arxiv: Physics::Plasma Physics
free text keywords: reactor model., modeling, Electronic computers. Computer science, plasma deposition, QA75.5-76.95, plasma etching
Powered by OpenAIRE Open Research Graph
Any information missing or wrong?Report an Issue
publication . Article . 1998

Plasma Process Modeling for Integrated Circuits Manufacturing

Meyyappan, M.; Govindan, T. R.;