Ion-Beam-Induced Defects in CMOS Technology: Methods of Study

Part of book or chapter of book, Preprint English OPEN
Fedorenko, Yanina G.;
  • Publisher: InTech
  • Subject: Condensed Matter - Materials Science
    mesheuropmc: technology, industry, and agriculture

Ion implantation is a non-equilibrium doping technique which introduces impurity atoms into a solid regardless of thermodynamic considerations. The formation of metastable alloys above the solubility limit, minimized contribution of lateral diffusion processes in device... View more
  • References (144)
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