A Nanoscale Plasma Etching Process for Pole Tip Recession of Perpendicular Recording Magnetic Head

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LIU, Shoubin ; HE, Dayao (2017)
  • Publisher: Kaunas University of Technology
  • Journal: (issn: 1392-1320, eissn: 2029-7289)
  • Related identifiers: doi: 10.5755/j01.ms.22.2.12953
  • Subject: selectivity | ion damage. | pole tip recession, plasma etching, selectivity, removal rate, ion damage | pole tip recession | removal rate | Mining engineering. Metallurgy | TN1-997 | plasma etching

<p>The pole tip of perpendicular recording head is constructed in a stacked structure with materials of NiCoFe, NiFe, Al<sub>2</sub>O<sub>3</sub> and AlTiC. The surfaces of different materials are set at different heights below the air-bearing surface of slider. This pa... View more
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