publication . Article . 2016

A Nanoscale Plasma Etching Process for Pole Tip Recession of Perpendicular Recording Magnetic Head

LIU, Shoubin; HE, Dayao;
Open Access English
  • Published: 01 May 2016 Journal: Medžiagotyra (issn: 1392-1320, eissn: 2029-7289, Copyright policy)
  • Publisher: Kaunas University of Technology
Abstract
<p>The pole tip of perpendicular recording head is constructed in a stacked structure with materials of NiCoFe, NiFe, Al<sub>2</sub>O<sub>3</sub> and AlTiC. The surfaces of different materials are set at different heights below the air-bearing surface of slider. This paper presented a plasma dry etching process for Pole Tip Recession (PTR) based on an ion beam etching system. Ar and O<sub>2</sub> mixed plasma at small incident angles have a high removal rate to the nonmagnetic material. It was utilised to etch the reference surface until it reaches the MT value. Low-energy Ar plasma at a small incident angle removes materials with selective ratios of 1 : 1.6 : 2...
Subjects
free text keywords: selectivity, ion damage., pole tip recession, pole tip recession, plasma etching, selectivity, removal rate, ion damage, removal rate, Mining engineering. Metallurgy, TN1-997, plasma etching
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publication . Article . 2016

A Nanoscale Plasma Etching Process for Pole Tip Recession of Perpendicular Recording Magnetic Head

LIU, Shoubin; HE, Dayao;