Hygroexpansion and Surface Roughness Cause Defects and Increase the Electrical Resistivity of Physical Vapor Deposited Aluminum Coatings on Paper

Other literature type, Article English OPEN
Martina Lindner; Julia Heider; Matthias Reinelt; Horst-Christian Langowski;
  • Publisher: Multidisciplinary Digital Publishing Institute
  • Journal: Coatings (issn: 2079-6412)
  • Publisher copyright policies & self-archiving
  • Related identifiers: doi: 10.3390/coatings9010033
  • Subject: TA1-2040 | relative humidity | inductively-coupled plasma mass spectrometer | electrical resistance | packaging | Engineering (General). Civil engineering (General) | thin films
    mesheuropmc: complex mixtures

Aluminum coatings, which are applied by physical vapor deposition (PVD), have to be virtually defect-free in barrier applications for the packaging industry. When aluminum is applied to paper, hygroexpansion and substrate roughness can impair the aluminum coating. Neith... View more
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