publication . Article . 2016

Electrical resistivity of CuAlMo thin films grown at room temperature by dc magnetron sputtering

Martin Birkett; Roger Penlington;
Open Access English
  • Published: 29 Jul 2016
  • Publisher: IOP
  • Country: United Kingdom
Abstract
We report on the thickness dependence of electrical resistivity of CuAlMo films grown by dc magnetron sputtering on glass substrates at room temperature. The electrical resistance of the films was monitored in situ during their growth in the thickness range 10–1000 nm. By theoretically modelling the evolution of resistivity during growth we were able to gain an insight into the dominant electrical conduction mechanisms with increasing film thickness. For thicknesses in the range 10–25 nm the electrical resistivity is found to be a function of the film surface roughness and is well described by Namba’s model. For thicknesses of 25–40 nm the experimental data was ...
Subjects
free text keywords: H300, Electronic, Optical and Magnetic Materials, Surfaces, Coatings and Films, Polymers and Plastics, Metals and Alloys, Biomaterials, Electrical resistivity and conductivity, Conductivity, Electronic engineering, Electrical resistance and conductance, Thermal conduction, Electron, Composite material, Thin film, Surface roughness, Sputter deposition, Materials science
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publication . Article . 2016

Electrical resistivity of CuAlMo thin films grown at room temperature by dc magnetron sputtering

Martin Birkett; Roger Penlington;