publication . Article . 2012

Determination of Optical and Physical Properties of ZrO2 Films by Spectroscopic Ellipsometry

Yusoh, R.; Horprathum, M.; Eiamchai, P.; Chindaudom, P.; Aiempanakit, K.;
Open Access
  • Published: 01 Jan 2012 Journal: Procedia Engineering, volume 32, pages 745-751 (issn: 1877-7058, Copyright policy)
  • Publisher: Elsevier BV
Abstract Film characterization based on spectroscopic ellipsometry (SE) is desirable in order to understand physical and optical characteristics of films. In this work, ZrO2 films were deposited on Si substrates by d.c. reactive magnetron sputtering with deposition times from 4 to 7 hr. The film thickness determined by SE technique was compared to field emission scanning electron microscopy (FE-SEM) results. From SE modelling process, the double-layer physical model and the Tauc-Lorentz for two oscillator dispersion models offered the best result. The refractive index at photon energy of 2.25 eV of the film was decreased from 2.14 to 2.08 with time of 4 to 7 hr,...
free text keywords: General Engineering, Analytical chemistry, Oscillation, Photon energy, Refractive index, Sputter deposition, Dispersion (optics), Materials science, Deposition (law), Ellipsometry, Band gap, ZrO2 films, d.c. reactive magnetron sputtering, spectroscopic ellipsometry, Engineering(all)
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